Copper, Iron, Zirconium manufacturer / supplier in China, offering Titanium Sputtering Target, Cumnni Sputtering Target, 3n5 Eb Melting Thin Film Coating Material Hafnium Target and so on.
Min. Order / Reference FOB Price | |
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1 Piece | US $40.00/ Piece |
Local Area: | Changsha, Hunan, China |
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R&D Capacity: | OEM, ODM, Other |
Payment Terms: | LC, T/T, PayPal, WesternUnion |
Type: | Metal Target |
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Certification: | TUV, ISO, CE |
Purity: | 99.9%-99.95% |
Chemical Composition: pure cobalt
Available Purity: 3N-3N5Transmitter
Production Technology: EB melting
Shapes: planar targets, rotary targets
Average Grain Size: <100um
Vanadium Sputtering Target is produced by melting technology. Because vanadium oxide has very special optical and electric properties, it can be applied for Infrared intelligent window, electro-optic switch device, and as laser protGrinder ection materials and stealth material. With up to 3Npurityand special annealing treatment, uniform grain size, lower gascontent, end user canobtain constant erosion rates as well as high purity and homogeneous thin film coating during PVD process.
COMPANYPROFILE:
Since 2014
Specializing in high purity sputtering targets.
Leader manufacturer of sputtering materials in China.
Qualified the world certificates such as ISO9001:2008 and SGS.
Comprehensive in R&D, manufacturing, and sales on thin film materials.
Export to more than 15 countries in Europe, Southeast Asia, South America and areas, etc.
OUR PRODUCTS *metal Target : W, Mo, Ta, Nb, Cu, V, Ni, Ti, Fe, Al ,Zr, Co, Au, Ag, Pt, etc.*Alloy Target :NiFe,NiCr,NiV,CuNi,TiAl,CoCr,CoFe, WTi, CoTaZr,CuInGa, ZnSn,CuZn, etc*CeramicTarget : TiO2,Al2O3,Ta2O5, ZrO2,SiC,SiO,SiO2, ITO, GZO, AZO, WS2,MoS2,Ga2O3,HfO2,etc*EvaporationMaterials : Crucible,Pellets,Granules,PiecesDrying Machine ,etc*Backing Plate: Cu, Mo, SS,etc*Bonding Service: Indium, Elastomer