Product DescriptionHigh Quality ZnAl Rotatable Sputtering target1.Detail:ContentZn and ZnAl alloy target 98:2wt%Purity≥99.95%RelativeDensity≥99.5%Production processVacuum meltingDimensionlength(max):4000mm,linearity:0.5mm,φ3x3,φ6x6unite power10kw/mapplication1.large area glass coating
2.PV:thin flim solar technology for solar reflective coating
3.PFD
4.TCODelivery date2 weeks after deposite(deponds onthe order quantity)
2.Why ushigh purity>99.9%high density7.17g/cmlow resistivity2mΩ·cm
3.
impurities:
Fe<=0.008%Cd<=0.001% Pb<=0.009%As<=0.0004%
Mn<=0.0004% Cu<=0.0003%K<=0.0003%Ca<=0.008%
Na<=0.0004% Cr<=0.0004%Mg<=0.005%Mo<=0.0003%