China 1200 Degree Horizontal Vacuum Plasma Enhanced Chemical Vapor Deposition Pecvd Laboratory Tube Furnace

PE-CVD (Plasma Enhanced Chemical Vapor Deposition) tube furnace system, which consists of 500W RF plasma source, 2" or 3.14" O.D optional split tube furnace, 4 channels precision mass flow meter with gas mixing tank, and high-quality mechanical pump.
The PE-CVD furnace is an ideal and affordable tool to deposit thin films or grow nanowire from a gas state (vapor) to a solid state, and benefits:
Lower temperature processing compared to conventional CVD.
Film stress can be controlled by high/low frequency mixing techniques.
Control over stoichiometry via process conditions.
Offers a wide range of material deposition, including SiOx, SiNx, SiOxNy and Amorphous silicon (a-Si:H) deposition.
Feature:
PECVD high temperature temperature vacuum furnace adopt aluminum oxide products to make the chamber rapid heating and low heat storge.
The resistance wire heating uniformly, load adopt small voltage and big current to improve service life of the heating element.
Brainpower procedure control temperature, easy to operation, and set the over temperature, breakdown protection.
Pecvd system tube furnace apply to laboratory graphene growing and carbon nanao-tube growth, it can make high quality transparent conducting film to mobile touch screen, panel computer, smart wear, sensor ect.
Specifications
Power0~500w
Voltage
AC220V, 50/60Hz
Tube materials
High Purity Quartz Tube
Temperature Controllers
Two digital controllers with PID control and self-tuning
Each has 51-segments programmable with protection for overheated and broken thermo-couple
Thermal Couple
K type
Temperature Accuracy
+/- 1º C
Heating Elements
Fe-Cr-Al adopted Mo Wire
Heating Zones
200+200mm
Constant Temperature Zone
100+100mm
Warranty
One year limited warranty (Consumable parts such as processing tubes, o-rings and heating elements are not covered by the warranty)Vacuum and water cooling system
Vacuum and Water Cooling System
Vacuum pump
High Speed Vacuum Pump,-0.1888Mpa Limit is installed inside the heavy duty mobile cart.
KF25 adapter and stainless steel pipe are connected between pump and tube flange with precision ball valve for customer's plug and play.
Water Chiller
10L/min,50W/ºC water cooling chiller with flange
Gas System
Mass Flowmeters & Gas Mixing Station
Multi channels gas control system(mainly from 1 channel to 4 channels),it can mix variety of gases as per a certain ratio into the tube furnace.The gas flow is controlled by precision mass flow-controllers,the controllers and gas mixers are installed in a heavy duty mobile cart where the tube furnace can be placed on the top.
MFC 1:Gas flow range from 0~100 SCCM
MFC 2&3: Control range from 0~200 SCCM
MFC 4: Control range from 0~500 SCCM
Gas inlet fitting: four 1/4NPS
Gas outlet fitting: four 1/4nps
Power:220VAC 50Hz
4 stainless steel needle valves are installed on the left side of the bottom case to manually control the mixing of 4 gas types.
Four channel gas flows are integrated into one PLC with touch screen panel to control.