China Cr Target Target Chromium Target

We supply rotary and planar arc cathodes as well as planar sputtering targets in the quality variants High Purity (HP) and Ultra High Purity (UHP):Products attributes of Cr sputtering targetCr Sputtering Target
ContentHot Insostatic PressingChromium
Purity99.5%,99.8% 99.9%,99.95%
RelativeDensity≥95%
DimensionLength(Max)2000mm;According to your draCrushing & Culling Machine wing or requirments.
ApplicationDecorative coating (vanity, cellphone, hardware, etc)Item NameHigh purity Chromium sputtering target
Cr sputtering targetPurity99.5%,99.8%,99.9%,99.95%ShapeSquare /round, according to your requestAvailable sizeRound: dia 25~350mm
Rectangular: length up to 1000mm
Customization is availableImpurity contentlower thanBall Screw 100ppmCertificatesISO9001:2008, SGS, the third test reportTechnicsVacuum meltingApplicationwidely used in coating processing industries
a: architectural glass, car using glass, graphic display field.
b:electronic and semiconductor field.
c:decoration and mould field.
d:optics coating materialsPlug AdvantageHigh Hard texture
Low impurity content
Better heat dissipation
High Tensile strengthDetailed informationChromium is silver white metal, extremely hard and corrosion-resistant. metal chromium is used as additives of aluminum alloys, cobalt alloys, titanium alloys, high temperature alloys and resistance heating alloy.Chromium oxide is used as light and heat resistant coatings, colorants of abrasives, glass and ceramics; catalysts in chemical synthesis. Chrome alum and dichromate are used as leather tanning, mordant dyeing, impregnating agents and a variety of pigments.Chrome plating and chromizing can make steel, copper, aluminum etc. metals develop corrosion-resistant and shiny surface, widely used for furniture, automotive, construction and other industries. In addition, the chrome ore is also extensively used for the production of refractories.Quality Standard(99.95% Cr)ElementValue(≤ppm)ElementValue(≤ppm)Fe5Al2Cu2P2Pb3Si4C4S15O42N1zApplication:Widely used in optical glassAlarm & Security Systems and touch panel glass film
Material TypeChromiumSymbolCrColor/ApperanceSilvery,metallicPurity>99.5%Molding processHIPDensity>7.15g/cm3(>99.5%)Maximum impurities content unit:PPM
Fe:50
Al:10
O:100Cu:10
Ni:10
C:20Si:20
N:20
The above data are just for reference,please contact us for more updated information or sending us you drawing with size and material needed.Packaging ofTin Powder: Vacuum sealed package inside, then wrapped with bubble and loaded to carton outside.
Shipping ofTin Powder:Shipping wayTimeNotesEMS7-10daysSampledeliveryDHL,Fedex,TNT,UPS7-10daysFor your choiceByAir7-10days25-100KGBySea25-30 daysSometimesneedmorethan30daysOur sputtering targets mainly consist of pure metals and alloys, available in botElectrode h planar and rotatable shapes
Featured targets from Rhexon:
1.Pure metal:
Ti, Zr, Ta, Nb, Mo, W, Ni, Cr, Al, Zn, Si, Cu,ITO,AZO.TZO,WC,Nb2O5,TiO2, SiO2 withplanarandrotarytype.,2.Typical alloytarget:
1) Ti/Al alloytarget(67:33,50:50at%)
2) W/Tialloytarget(90:10wt%),
3) Ni/Valloytarget(93:7,wt%)
4) Ni/Cralloytarget(80:20, 70:30,wt%),
5) Al/Cralloytarget(70:30,50:50at%)
6) Nb/Zralloytarget(97:3,90:10wt%
7) Si/Alalloytarget(90:10,95:5,98:2,70:30,wt%)
8) Zn/Alalloy
9)Pure Cr target(99.95%, 99.995%)
10)Al/Cralloytarget (70:30, 50:50at%)
11) Ni/Cu alloytarget(70:30,80:20,wt%)
12)Al/Ndalloytarget(98:2wt%)
13)Mo/Nb alloytarget(90:10,wt%)
14)TiAlSi alloy target (Ti/Al/Si=30/60/10, 33/67, 40/50/10 ,wt% and at%)
15)CrAlSi alloy target(Cr/Al/Si=30/60/10 ,wt% and at%)and so on, and help set of target material