China DC RF Dual-Head High Vacuum 2" Magnetron Plasma Sputtering Coater

DC/RF Dual-Head High Vacuum 2" Magnetron Plasma Sputtering Coater

CY-VTC-600-2HD is a compact magnetron sputtering system with dual 2" target sources, e.g., one DC source for coating metallic film, and another RF source for coating non-metallic material. A film thickness tracker is included to enable the user to control processing easily. This coater is designed for coating both single or multiple film layers for a wide range of materials, such as alloy, ferroelectric, semiconductor, ceramic, dielectric, optical, PTFE etc. at low cost.

Specification of the dual head magnetron plasma sputtering coater

Input Power220VAC 50/60Hz, single phase
2000W (including pump)
Source PowerTwo sputtering power sources are integrated into one control box
DC source: 500W for coating metallic materials
RF source: 300W for coating non-metallic materials
Magnetron Sputtering HeadTwo 2" Magnetron Sputtering Heads with water cooling jackets are included
One is connected to RF source for non-conductive materials
The other one is connected to DC source for coating metallic materials
Target size requirement: 2" diameter
Thickness Range: 0.1 - 5 mm for both metallic and non-conductive targets (including backing plate)
One Cu and one fused SiO2 targets are included for demo testing
Recommend Coating MethodCustomized coater: Two DC heads without RF sputtering; two RF heads without DC sputering; 3 RF head are available upon requestOptional: 148 cm RF cable is replaceale with extra cost Vacuum ChamberVacuum Chamber: 300 mm Dia x 300 mm height, made of stainless steel
Observation Window: 100 mm diameter
Hinged type lid on top with pneumatic power pole makes target exchange easily
Sample HolderSample holder size: 140mm dia. for. 4" wafer max
Sample holder rotation speed is adjustable: 1 - 20 rpm for uniform coating
The holder temperature is adjustable from RT to 500°C Max with accuracy +/- 1.0 °CGas Flow Control
Two precision digital MFC (mass flow controller) are installed to allow two types of gases to be filled in
Flow rate: 200 ml/min max. (0-200 SCCM)
Flow rate is adjustable on the 6" touch screen control panelVacuum Pump Station
High speed turbo vacuum pump (made in Germany) is directly installed on the vacuum chamber for max. vacuum level
Heavy duty dual stage mechanical pump, 220 liters/minute (7.8CFM) is connected to turbo pump for faster pumping speed
Mobile pump station is included and the compact sputtering coater can be placed on top of station
Standard Vacuum Level: < 4x10^-5 Torr . Max. vacuum level: 10^-6 torr with chamber bakingWater Chiller
One Digital Temperature Controlled Recirculating Water Chiller is included for cooling both magnetron sputtering heads.
Refrigeration range : 5~35°C
Floowing Rate: 16L/minute
OptionalsPrecise quartz Film Thickness Monitor is available upon reuqest to built into the chamber to monitor coating thickness with accuracy 0.10 Å.
Pricesion Thin Film & Coating Analysis Systems with Measurement Capability is available for measure film thickness after coating.
Overall Dimensions
Lid closed: 48" x 28" x 32" Lid open: 48" x 28" x 37"Net Weight200 kgWarrantyOne years limited warranty with lifetime support

reference picture of the dual head magnetron plasma sputtering coater
other related coating machine that we have:
our company information:
Zhengzhou CY Scientific Instrument Co., Ltd.-founded in 2013 is a high and new technology enterprise registered in Zhengzhou,Henan province. We mainly supply the lab instruments for material research in labs like the cutting machine, milling machine, polishing machine, sintering furnace, mixing machine, glove box, film coating machine, etc.
contact information: