China Electron Gases Hydrogen Bromide Hbr

Product Information
Hydrogen bromide is used in combination with hydrogen chloride and chlorine for plasma etching of polysilicon as STI /Silicon fin etch in FinFET or Trigate, silicon gate stack etch, and small diameter TSV etch.
Product Specification

Product nameHydrogen bromide TypeHBrPurityn5.0Cylinder Spec10L / 47L Fill contens (20˚C)10kg / 50kg Fill pressure (20˚C,-5%) 23 barValve type DISS 634ApplicationsSemiconductor: gas phase etching gas.

Package type
Company information
Suzhou Xunhe Chemical Co., Ltd is staffed by trained personnel, combine many years experience in Gas industry .We supply cylinder gas, electronic gas, etc ., and the gas holder, panel, valves and fittings and other equipment, parts and engineering services to our customers in China and worldwide; The products are involved in various industrial fields, such as semiconductor chip, solar cell, LED, TFT-LCD, optical fiber, glass, laser, medicine , etc., Our mission is to partner with our global customers to provide support, solutions and quality products that are innovative,reliable, and safe.
Our products mainly include: H2, O2, N2, Ar, CO2, propane, acetylene, helium, laser mixed gas, SiH4, Sih2cl2, SiHCL3, SiCL4, NH3, CF4, NF3, SF6, HCL, N2O, doping mixed gas (TMB, PH3, B2H6) and other electronic gases.