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China Industrial Gases Sulfur Hexafluoride for Selling

Min. Order / Reference FOB Price
10 kg	Contact Supplier

Local Area:	Suzhou, Anhui, China
R&D Capacity:	OEM, ODM, Other
Payment Terms:	LC, T/T, PayPal

CAS No.:	2551-62-4
Formula:	Sf6
EINECS:	219-854-2

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Product Description

Sulfur hexafluoride is used for plasma etching prior to chemical vapor deposition (CVD). Its uses include oxide etching, nitride etching, and wafer cleaning. Sulfur hexafluoride is also used in plasma chamber cleaning processes.
Specifications:

Product nameSulfur hexafluoride TypeSF6Purity n5.0Cylinder Spec 47L / 470LFill contens (20˚C)50kg / 500kgFill pressure (20˚C,-5%)23 barValve typeDISS 716ApplicationsThe semiconductor field is used in the chemical vapor deposition process,because of high resistance at high voltages, as an insulating agent for electrical equipment, leak detection gas,
and Sause spectrometer in the laboratory.

Package Details:

Purity(SF6)PackageCapacity99.995%,
99.999%40L/50kg(cylinder)2500 tons to 7000tons per year
.440L/500kg(cylinder)600L/600kg(cylinder)ISO Tank/13000kg

SF640L Cylinder43L Cylinder440L CylinderStandardGB 5099/ISODOT-3AADOT-3AAValue typeQF-2C9/QF-2CGA590DISS716Pressure12.5Mpa2265PSI16.6MpaFilling Weight48/50 KGS48/50 KGS500 KGS

Package type: