China Manufacture Offer High Pure 99.999% ~99.9999% Zinc Pellets China Evaporation Metal Pellets Chi

Product Description99.99% Gold Au Sputtering Plate Gold Target for Thin Film CoatingGas Generation Equipment & Parts Gold has a density of 19.3 g/cm3, almost identical to that of tungsten at 19.25 g/cm3; as such, tungsten has been used in counterfeiting of gold bars, such as by plating a tungsten bar with gold, or taking an existing gold bar, drilling holes, and replacing the removed gold with tungsten rods. By comparison, the density of lead is 11.34 g/cm3, and that of the densest element, osmium, is 22.588 ± 0.015 g/cm3.Product Name99.95% Pure Tungsten Evaporation Material W Granule Tungsten PelletMaterialTungsten pelletColorSilveryPurityAbove 99.95%SizeRegular 3*3mm, CustomizedThermal Evaporation TechniquesW Basket, TiB2-BN Crucible, BNCrucibleTechnologyVacuum Melting, Patented thermo-mechanical process and machine workProduct Type:Vanadium 99.9%Purity99.9%Shape1-10mm, according to your requestSizeRound: dia6*6mmRectangular: 10*10*2mmCustomization is availableStandardSUS201, SUS304, SUS316, A2-70, A2-80, A4-80, 4.8 6.8 8.8 10.9 12.9CertificatesISO9001:2008, SGS, The third test reportTechnicsVacuum Manipulator Melting, Patented thermo-mechanical processApplicationWidely used in coating processing industriesA: Solar Photovoltaic Application.B: Electronic and Semiconductor Application.C: Decoration and Coating Application. etc.Product Name99.95% Pure Tungsten Evaporation Material W Granule Tungsten PelletMaterialTungsten pelletColorSilveryPurityAbove 99.95%SizeRegular 3*3mm, CustomizedThermal Evaporation TechniquesW Basket, TiB2-BN Crucible, BNCrucibleTechnologyVacuum Melting, Patented thermo-mechanical process and machine workProduct Name99.99% Gold Au Sputtering Plate Gold Target for Thin Film CoatingPurity99.99%ColorGold, Lustrous.SputterDCSizeTube/ Plate, CustomizedProcessing MethodPowder metallurgyServiceTarget Bonding withIndium

Evaporation materials high purity titanium pellets 99.995 titanium granules

Item Name

High purity Ti pellets

Purity

99.99% ,99.999%

Available size

Customization is available

Certificates

ISO9001:2008, SGS, the third test report

Impurity content

Low

Application

Widely used in coating processing industries, semiconductor and electronic field ,glass coating and decoration.

Detailed information

Pure titanium and titanium-based alloy are new-style structural materials, mainly used for aerospace industry and marine industry.

Titanium can melt with iron, aluminum, vanadium or molybdenum and other elements, creating high-strength light alloy, which is widely used in all respects, including aerospace ( jet engines, missiles and spacecraft), military, industrial process (chemical and petroleum products, seawater desalination and papermaking), automobiles, agri-food, medicine (prostheses, orthopedic transplant and dental equipment and filler), sporting goods, jewelry and mobile phones and so on.

Quality Standard (99.999% Ti)

Element

Value(<ppm)

Element

Value (<ppm)

Element

Value(<ppm)

Ag

0.05

Al

0.11

As

0.03

Au

0.05

B

0.01

Ba

0.005

Be

0.005

Bi

0.01

Br

0.05

Ca

0.2

Cd

0.05

Ce

0.005

Hg

0.1

Fe

3.2

Ga

0.05

I

0.01

Ge

0.05

Hf

0.01

In

0.05

Ir

0.01

K

0.01

La

0.005

Li

0.01

Pt

0.05

Mg

0.06

Mn

0.06

Mo

Chemical Equipment & Machinery

0.5

Na

0.01

Nb

0.2

Nd

0.005

Ni

0.24

Os

0.01

P

0.01

Pb

0.01

Pd

0.01

Re

0.01

Rh

0.05

Ru

<0.01

Sb

0.05

Sc

0.05

Se

<0.05

Sm

0.005

Sn

0.05

W

<0.01

Ta

5

V

0.02

Te

<0.05

Th

0.0001

Dy

0.005

Er

<0.005

F

0.05

Zr

0.05

S

0.02

Si

0.24

Cr

0.06

Co

<0.01

Zn

0.05

Cu

0.28

Cl

0.23

Cs

0.01

The sputtering targets we are manufacturing show outstanding performance by virtue of high density, excellent purity, and distinguished homogeneous microstructure.
Our sputtering targets mainly consist of pure metals and alloys, available in both planar and rotatable shapes.
Featured targets from Rhexon:
1.Pure metal:
Ti, Zr, Ta, Nb, Mo, W, Ni, Cr, Al, Zn, Si, Cu,ITO,AZO.TZO,WC,Nb2O5,TiO2, SiO2 withplanarandrotarytype.,2.Typical alloytarget:
1) Ti/Al alloytarget(67:33,50:50at%)
2) W/Tialloytarget(90:10wt%),
3) Ni/Valloytarget(93:7,wt%)
4) Ni/Cralloytarget(80:20, 70:30,wt%),
5) Al/Cralloytarget(70:30,50:50at%)
6) Nb/Zralloytarget(97:3,90:10wt%
7) Si/Alalloytarget(90:10,95:5,98:2,70:30,wt%)
8) Zn/Alalloy
9)Pure Cr target(99.95%, 99.995%)
10)Al/Cralloytarget (70:30, 50:50,15:85,67:33,wt%and at%)
11) Ni/Cu alloytarget(70:30,80:20,wt%)
12)Al/Ndalloytarget(98:2wt%)
13)Mo/Nb alloytarget(90:10,wt%)
14)TiAlSiFastener & Fitting alloy target (Ti/Al/Si=30/60/10, 33/67, 40/50/10 ,wt% and at%)
15)CrAlSi alloy target(Cr/Al/Si=30/60/10 ,wt% and at%)and so on, and help set of target materi