China Multi-Function Ion Plating Machine

Multi-function ion plating machine
1. Vacuum process;
2. Non-pollution
3. Get metallized and colorful film
4. Full automatic
Multi-function ion plating machine mainly integrate the technology of MF magnetron sputtering and electric arc ion evaporation, combining the ion source and the pulse bias voltage. It is fully automatic control when coating films.
Applied industry: It is widely used in the watchband, watchcase, jewelry, mobile shell, hardware, tableware, etc. It can coat TiN, TiC, TiCN, TiAlN, CrN, Cu, Au, Al2O3 and other decorative films. It can get fineness and smooth film, good adhesion.
More information about our vacuum coating machine, pls do not hesitate to contact:
Contact person: Mandy Liu
Phone No.: +8613825755941/+8615989615980

Mode
DimensionJTL-0910JTL-1100JTL-1250900*1000mm1100*1000mm1250*1500mm
Coating mode and main confirgurationSix multi-arc targets + one set of column targets + one set of plane rectangle magnetron sputtering targetsEight multi-arc targets + a pair of twin (MF)magnetron sputtering targetsTwelve multi-arc targets + two sets of plane rectangle magnetron sputtering targets+ a pair of twin (MF)magnetron sputtering targetsPower sourceElectric arc power, DC magnetron power, MF magnetron power, filament power, pulse power, linear ionized source.Process gas controlQuality flowmeter + electromagnetism ceramic valveVacuum chamber structureVertical single(side) door, pump system postposition, double water-coolingVacuum systemMolecule pump +Roots pump +Mechanical pump(5.0*10 -5 Pa)
Diffusion pump +Roots pump +Mechanical pump(5.0*10 -4 Pa)Workpiece baking temperature
Normal temperature to 350 centi-degree PID control, radiation heating.Workpiece motion modePublic rotation Frequency control: 0-20 rotation per minuteMeasure modeNumber display composite vacuum gauge: from atmosphere to 1.0*10 -5 PaControl modeManual/Automatic/PC/PLC + HMI/PC four choice of control modeRemarkWe can design the dimension of the equipment according to customer's special technique requirement.