China Nicr Sputtering Target Sputtering Target Nicr Nicr Sputter Target

Thin filmcoating material NiCr sputtering target
Product:NiCr, other composition can be customizedPurity: 99.9%-99.95%Size: customizedShape: Planar and rotaryTechnology:Vacuum MeltingApplication:semiconductor field to deposit barrier or adhesion layersPacking: VacElectronic Instrument umm sealed, wooden case

Nickel Chromium Sputtering Targets are produced by melting technology, it's used for depositing NiCr thin film. As this mEmergency Light & Indicator Light aterial has relatively large resistivity, more resistant to oxidation and low temperature coefficient of resistance, so NiCr thin films areWeighing & Measuring Apparatus widely used for making resistors thin film for IC application. Nickel chromium sputtering targets can also applied for low-E glass coating. With up to 3N5purity, uniform grain size, lower oxygencontent, end user canobtain constant erosion rates as well as high purity and homogeneous thin film coating during PVD process.

Features

Chemical Composition: NiCr93/7wt%, NiCr90/10wt%, NiCr80/20wt%, NiCr70/30wt%, NiCr60/40wt%, NiCr40/60wt%,NiCr50/50wt%

Segregation of weight: +/-0.5wt%

Available Purity: 2N8, 3N, 3N5

Production Technology: melting

Shapes: planar targets

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Company Profile:

Since 2014

Specializing in high purity sputtering targets.

Leader manufacturer of sputtering materials in China.

Qualified the world certificates such as ISO9001:2008 and SGS.

Comprehensive in R&D, manufacturing, and sales on thin film materials.

Export to more than 15 countries in Europe, Southeast Asia, South America and areas, etc.

OUR ADVANTAGE1,Many years manufacturing & exporting experience.2 Strict & complete QC systerBearing m3,Perfect after sale systerm
OUR SERVICE

Professional and efficientWe own a strong teamwork of professional R&D team,manufacturing team, sales team and after-sales service team.Provide you 12 hours fastest service.

PRODUCTION PROCESS