China Wholesales Purity 99.998% Sulfur Hexafluoride with Sf6

Sulfur hexafluoride is used for plasma etching prior to chemical vapor deposition (CVD). Its uses include oxide etching, nitride etching, and wafer cleaning. Sulfur hexafluoride is also used in plasma chamber cleaning processes.
Specifications:

Product nameSulfur hexafluoride TypeSF6Purity n5.0Cylinder Spec 47L / 470LFill contens (20˚C)50kg / 500kgFill pressure (20˚C,-5%)23 barValve typeDISS 716ApplicationsThe semiconductor field is used in the chemical vapor deposition process,because of high resistance at high voltages, as an insulating agent for electrical equipment, leak detection gas,
and Sause spectrometer in the laboratory.

Package Details:

SF640L Cylinder43L Cylinder440L CylinderStandardGB 5099/ISODOT-3AADOT-3AAValue typeQF-2C9/QF-2CGA590DISS716Pressure12.5Mpa2265PSI16.6MpaFilling Weight48/50 KGS48/50 KGS500 KGS

Purity(SF6)PackageCapacity99.995%,
99.999%40L/50kg(cylinder)2500 tons to 7000tons per year
.440L/500kg(cylinder)600L/600kg(cylinder)ISO Tank/13000kg

Package Type
Company Information
Suzhou Xunhe Chemical Co., Ltd is staffed by trained personnel, combine many years experience in Gas industry .We supply cylinder gas, electronic gas, etc ., and the gas holder, panel, valves and fittings and other equipment, parts and engineering services to our customers in China and worldwide; The products are involved in various industrial fields, such as semiconductor chip, solar cell, LED, TFT-LCD, optical fiber, glass, laser, medicine , etc., Our mission is to partner with our global customers to provide support, solutions and quality products that are innovative,reliable, and safe.
Our products mainly include: H2, O2, N2, Ar, CO2, propane, acetylene, helium, laser mixed gas, SiH4, Sih2cl2, SiHCL3, SiCL4, NH3, CF4, NF3, SF6, HCL, N2O, doping mixed gas (TMB, PH3, B2H6) and other electronic gases.