High Quality Chrome Sputtering Target Chromium for Coating Film

Products attributes of Cr sputtering targetCr Sputtering Target
ContentHot Insostatic PressingChromium
Purity99.5%,99.9%,99.95%
RelativeDensity≥95%
DimensionLength(Max)2000mm;According to your drawing or requirments.
ApplicationDecorative coating (vanity, cellphone, hardware, etc)

Item Name

High purity Chromium sputtering target

Cr sputtering target

Purity

99.5%,99.8%,99.9%,99.95%

Shape

Flat target, according to your request

Available size

Round: dia 25~300mm,Thickness:3~10mm

Rectangular: Length up to 1500mm

Customization is available

Certificates

ISO9001:2008, SGS, The third test report

Technics

Vacuum Melting,Patented thermo-mechanical process

Application

Widely used in coating processing industries

A: Solar Photovoltaic Application.

B: Electronic and Semiconductor Application.

C: Decoration and Coating Application. etc

According the drawing requestDelivey time 7 daysas drawingas drawing

Packaging ofTin Powder: Vacuum sealed package inside, then wrapped with bubble and loaded to carton outside.

Shipping ofTin Powder:

Shipping way

Time

Notes

EMS

7-10days

Sampledelivery

DHL,Fedex,TNT,UPS

7-10days

For your choice

ByAir

7-10days

25-100KG

BySea

25-30 days

Sometimesneedmorethan30days

Our sputtering targets mainly consist of pure metals and alloys, available in both planar and rotatable shapes
Featured targets from Rhexon:
1.Pure metal:
Ti, Zr, Ta, Nb, Mo, W, Ni, Cr, Al, Zn, Si, Cu,ITO,AZO.TZO,WC,Nb2O5,TiO2, SiO2 withplanarandrotarytype.,2.Typical alloytarget:
1) Ti/Al alloytarget(67:33,50:50at%)
2) W/Tialloytarget(90:10wt%),
3) Ni/Valloytarget(93:7,wt%)
4) Ni/Cralloytarget(80:20, 70:30,wt%),
5) Al/Cralloytarget(70:30,50:50at%)
6) Nb/Zralloytarget(97:3,90:10wt%
7) Si/Alalloytarget(90:10,95:5,98:2,70:30,wt%)
8) Zn/Alalloy
9)Pure Cr target(99.95%, 99.995%)
10)Al/Cralloytarget (70:30, 50:50at%)
11) Ni/Cu alloytarget(70:30,80:20,wt%)
12)Al/Ndalloytarget(98:2wt%)
13)Mo/Nb alloytarget(90:10,wt%)
14)TiAlSi alloy target (Ti/Al/Si=30/60/10, 33/67, 40/50/10 ,wt% and at%)
15)CrAlSi alloy target(Cr/Al/Si=30/60/10 ,wt% and at%)and so on, and help set of target material