High Quality Sputtering Chrome Targets for Vacuum Coating Machines/Equipment/Plant/System

Products attributes of Cr sputtering target
Item Name
High purity Chromium sputtering target
Cr sputtering target
Purity
99.5%,99.8%,99.9%,99.95%
Shape
Flat target, according to your request
Available size
Round: dia 25~300mm,Thickness:3~10mm
Rectangular: Length up to 1500mm
Customization is available
Certificates
ISO9001:2008, SGS, The third test report
Technics
Vacuum Melting,Patented thermo-mechanical process
Application
Widely used in coating processing industries
A: Solar Photovoltaic Application.
B: Electronic and Semiconductor Application.
C: Decoration and Coating Application. etc
Packaging ofTin Powder: Vacuum sealed package inside, then wrapped with bubble and loaded to carton outside.
Shipping ofTin Powder:Shipping way
Time
Notes
EMS
7-10days
Sampledelivery
DHL,Fedex,TNT,UPS
7-10days
For your choice
ByAir
7-10days
25-100KG
BySea
25-30 days
Sometimesneedmorethan30daysOur sputtering targets mainly consist of pure metals and alloys, available in both planar and rotatable shapes
Featured targets from Rhexon:
1.Pure metal:
Ti, Zr, Ta, Nb, Mo, W, Ni, Cr, Al, Zn, Si, Cu,ITO,AZO.TZO,WC,Nb2O5,TiO2, SiO2 withplanarandrotarytype.,2.Typical alloytarget:
1) Ti/Al alloytarget(67:33,50:50at%)
2) W/Tialloytarget(90:10wt%),
3) Ni/Valloytarget(93:7,wt%)
4) Ni/Cralloytarget(80:20, 70:30,wt%),
5) Al/Cralloytarget(70:30,50:50at%)
6) Nb/Zralloytarget(97:3,90:10wt%
7) Si/Alalloytarget(90:10,95:5,98:2,70:30,wt%)
8) Zn/Alalloy
9)Pure Cr target(99.95%, 99.995%)
10)Al/Cralloytarget (70:30, 50:50at%)
11) Ni/Cu alloytarget(70:30,80:20,wt%)
12)Al/Ndalloytarget(98:2wt%)
13)Mo/Nb alloytarget(90:10,wt%)
14)TiAlSi alloy target (Ti/Al/Si=30/60/10, 33/67, 40/50/10 ,wt% and at%)
15)CrAlSi alloy target(Cr/Al/Si=30/60/10 ,wt% and at%)and so on, and help set of target material