Lab Ion Sputtering Coater, Sem Ion Sputtering Coater, Ion Sputtering Coater Manufacturer manufacturer / supplier in China, offering Mini Size Ion Sputter Coater for Sem Sample Preparation, Multi-Layer Boards CNC Single Spindle Guide Hole Puncher with CCD Image System, Single Spindle CCD Camera Target Hole Drilling Punching Machine for Fr4 Glass Fiber Boards and so on.
Min. Order / Reference FOB Price | |
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1 Piece | US $75000.00/ Piece |
Local Area: | Guangzhou, Guangdong, China |
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R&D Capacity: | OEM, ODM, Other |
Payment Terms: | LC, T/T, PayPal, WesternUnion |
Usage: | Semiconductor |
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Type: | Plate Exposure |
Page: | Single Face |
MD-SB-402 Mask Aligner is mainly designed for double aligning and exposure process of photoelectric device, power device, sensors, hybrid circuits, micro wave device and MEMS etc.
Main Features:
Alignment:Double layer thin three-dimensional alignment stage with high precision by V-linear guideway and θ-direction thin bearing, center slippery piece, high linearity and rotating precision.
Mechanical arm: Linear guideway and Ball screw, high positioning precision and repeatability.
Top mask system: THK adjusted separation linear guideway is adopted for the up-down guideway of top mask, the digital micrometer with high resolution is used for driver, high positioning precision and repeatability.
Align view system: Clear obtained by horizontal split field microscope with symmetrical double light route
Electric control system: Convenient operation and steady performance achieved by PLC and Touchscreen control, running status display and much testing function
Exposure system: Top and bottom unattached exposure system with advanced structure, providing high light intensity, uniformity and optical resolution
Main Specifications:
Alignment stage parameters:
X-axis: ±4mm
Y-axis: ±4mm
θ-direction: ±5°
Size of wafer : φ4″
Size of mask : 5″x5″
Precision of double-sides aligning: ±0.003mm
Mechanical arm system parameters:
Gap of mechanical arm from lower mask:
0~100μm(Min increment:1μm)
Exposure system parameters:
Illumination: 250W high pressure mercury vapor lamp
Wavelength: UV365
Max exposure area: φ110mm
Non-uniformity:±3%
Printing resolution: 3μm (plus photoresist)
Cooling of mercury vapor lamp: wind
Exposure time: 0~999s(Min increment:1s)
Split view field microscope parameters:
Magnification: 65X
View field: φ3.3mm
Separation between objectives: 26~70mm
Facilities:
Voltage: ~220V±22V(50HZ)
Power consumption: 1.5KW
Light: Red or yellow
N2 pressure:0.2~0.4MPa
Air pressure: 0.5~0.7MPa
Vacuum: -0.08~-0.1mPa
Dimensions & Weight:
Weight: 480KG
Overall Dimensions: 950mmx850mmx1500mm
Comprason table:
Model:
Mask Size
Wafer Size
Exposure
Type
Manual /Automatic
Application has been in
MD-BG-401A
5inch
4inch
Single side
manual
Small or middle IC,SAW,other
MD-SB-402
5inch
4inch
Dual side
manual
Photoelectric/power device,sensors,hybrid circuits,MEMS etc.
MD-BG-403D
5inch
4inch
Dual side
manual
GPP diode,power device,others.
MD-BG-403S
5inch
4inch
Single side
manual
MD-BG-406
7inch
6inch
Single/double
manual
IC.GPP,LED,MEMS,others
MD-BG-407
5inch
2/3/4
inch
Single side
automatic
LED,Diode,triode,etc.
MD-BG-601A
7inch
6inch
Single/double
manual
Power,sensor,photoelectron devise,etc.
MD-BG-602B/C BX
7inch
6inch
Single/double
manual
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Guangzhou minder-hightech co., ltd www.minder-hightech.com
No.1 Xingya 3 Road, panyu district, guangzhou, China
Shunyu Hu0086-15813334038
Cell phone:0086-15813334038