Business Type:
Manufacturer/Factory
Establishment:
2014
R&D Capacity:
ODM, OEM, Other
Terms of Payment:
LC, T/T, PayPal, WesternUnion
Main Markets:
South America, Europe, Southeast Asia, Middle East
OEM/ODM Service
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Supplier Homepage Packaging & Printing Pre-Press Equipment Exposure Machine China Dual Side Exposure Mask Aligner MD-Sb-402

China Dual Side Exposure Mask Aligner MD-Sb-402

Get Latest Price
Min. Order / Reference FOB Price
1 Piece US $75000.00/ Piece
Local Area: Guangzhou, Guangdong, China
R&D Capacity: OEM, ODM, Other
Payment Terms: LC, T/T, PayPal, WesternUnion
Usage: Semiconductor
Type: Plate Exposure
Page: Single Face
Manual Mask Aligner MD-SB-402

MD-SB-402 Mask Aligner is mainly designed for double aligning and exposure process of photoelectric device, power device, sensors, hybrid circuits, micro wave device and MEMS etc.

Main Features:

Alignment:Double layer thin three-dimensional alignment stage with high precision by V-linear guideway and θ-direction thin bearing, center slippery piece, high linearity and rotating precision.

Mechanical arm: Linear guideway and Ball screw, high positioning precision and repeatability.

Top mask system: THK adjusted separation linear guideway is adopted for the up-down guideway of top mask, the digital micrometer with high resolution is used for driver, high positioning precision and repeatability.

Align view system: Clear obtained by horizontal split field microscope with symmetrical double light route

Electric control system: Convenient operation and steady performance achieved by PLC and Touchscreen control, running status display and much testing function

Exposure system: Top and bottom unattached exposure system with advanced structure, providing high light intensity, uniformity and optical resolution

Main Specifications:
Alignment stage parameters:
X-axis: ±4mm
Y-axis: ±4mm
θ-direction: ±5°
Size of wafer : φ4″
Size of mask : 5″x5″
Precision of double-sides aligning: ±0.003mm
Mechanical arm system parameters:
Gap of mechanical arm from lower mask:
0~100μm(Min increment:1μm)
Exposure system parameters:
Illumination: 250W high pressure mercury vapor lamp
Wavelength: UV365
Max exposure area: φ110mm
Non-uniformity:±3%
Printing resolution: 3μm (plus photoresist)
Cooling of mercury vapor lamp: wind
Exposure time: 0~999s(Min increment:1s)
Split view field microscope parameters:
Magnification: 65X
View field: φ3.3mm
Separation between objectives: 26~70mm
Facilities:
Voltage: ~220V±22V(50HZ)
Power consumption: 1.5KW
Light: Red or yellow
N2 pressure:0.2~0.4MPa
Air pressure: 0.5~0.7MPa
Vacuum: -0.08~-0.1mPa
Dimensions & Weight:
Weight: 480KG
Overall Dimensions: 950mmx850mmx1500mm

Comprason table:

Model:

Mask Size

Wafer Size

Exposure

Type

Manual /Automatic

Application has been in

MD-BG-401A

5inch

4inch

Single side

manual

Small or middle IC,SAW,other

MD-SB-402

5inch

4inch

Dual side

manual

Photoelectric/power device,sensors,hybrid circuits,MEMS etc.

MD-BG-403D

5inch

4inch

Dual side

manual

GPP diode,power device,others.

MD-BG-403S

5inch

4inch

Single side

manual

MD-BG-406

7inch

6inch

Single/double

manual

IC.GPP,LED,MEMS,others

MD-BG-407

5inch

2/3/4

inch

Single side

automatic

LED,Diode,triode,etc.

MD-BG-601A

7inch

6inch

Single/double

manual

Power,sensor,photoelectron devise,etc.

MD-BG-602B/C BX

7inch

6inch

Single/double

manual

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Guangzhou minder-hightech co., ltd www.minder-hightech.com

No.1 Xingya 3 Road, panyu district, guangzhou, China

Shunyu Hu0086-15813334038
Cell phone:0086-15813334038