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Manufacturer/Factory
Establishment:
2014
R&D Capacity:
ODM, OEM, Other
Terms of Payment:
LC, T/T, PayPal, WesternUnion
Main Markets:
South America, Europe, Southeast Asia, Middle East
OEM/ODM Service
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Supplier Homepage Packaging & Printing Pre-Press Equipment Exposure Machine China Dual Side Single Side Photo Lithography Exposure Machine MD-Bg-403D 403s

China Dual Side Single Side Photo Lithography Exposure Machine MD-Bg-403D 403s

Get Latest Price
Min. Order / Reference FOB Price
1 Piece US $75000.00/ Piece
Local Area: Guangzhou, Guangdong, China
R&D Capacity: OEM, ODM, Other
Payment Terms: LC, T/T, PayPal, WesternUnion
Usage: Semiconductor
Type: Plate Exposure
Page: Single Face
Dual side/single side photo lithography exposure machine MD-BG-403D & 403S

MD-BG-403D & 403S Mask Aligner is used in exposure process of GPP diode, power device, and other semiconductor device, with convenient operation, steady performance and high productivity.


Main Features:
Mask chuck: two pieces of mask chuck, exposure with exchange, improving work efficiency.
Size of mask: Max5″x5″
Size of wafer: Maxφ4″
Exposure system:Using import mercury lamp,ellipsoidal reflector ,fly's eyes- lens. High light intensity, uniformity and optics resolution can be obtained.
Exposuring Resolution: 5um
Exposure light intensity: ≥10mW/cm2(365nm)
Exposure time:0-999.9s continuous setting
Max exposure area: φ110mm
Non-uniformity: ±3%
Align microscope
Align microscope: two pieces of microscope, operated by two person at the same time, improving productivity.
Total magnification: 20x~40x
Electric control system
Operation is convenient by PLC and LCD display adopted in electric control system, and high reliability and stability could be obtained. Stability and reliability of the equipment are improved by use of key parts from import and professional manufacturer and pneumatic elements from SMC, and personal service is provided for different user.

Main Specifications:
Size of mask: Max5″x5″
Size of wafer: Maxφ4″
Exposuring resolution:5um
Exposure system and wavelength
250W High pressure mercury lamp, UV365
Exposure time:0-999.9s continuous setting
Max Exposure area: φ110mm
Non-uniformity of Exposure: ±3%
Split view field microscope
Total magnification: 20x~40x

Comprason table:

Model:

Mask Size

Wafer Size

Exposure

Type

Manual /Automatic

Application has been in

MD-BG-401A

5inch

4inch

Single side

manual

Small or middle IC,SAW,other

MD-SB-402

5inch

4inch

Dual side

manual

Photoelectric/power device,sensors,hybrid circuits,MEMS etc.

MD-BG-403D

5inch

4inch

Dual side

manual

GPP diode,power device,others.

MD-BG-403S

5inch

4inch

Single side

manual

MD-BG-406

7inch

6inch

Single/double

manual

IC.GPP,LED,MEMS,others

MD-BG-407

5inch

2/3/4

inch

Single side

automatic

LED,Diode,triode,etc.

MD-BG-601A

7inch

6inch

Single/double

manual

Power,sensor,photoelectron devise,etc.

MD-BG-602B/C BX

7inch

6inch

Single/double

manual

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Guangzhou minder-hightech co., ltd www.minder-hightech.com

No.1 Xingya 3 Road, panyu district, guangzhou, China

Shunyu Hu0086-15813334038
Cell phone:0086-15813334038