Lab Ion Sputtering Coater, Sem Ion Sputtering Coater, Ion Sputtering Coater Manufacturer manufacturer / supplier in China, offering Mini Size Ion Sputter Coater for Sem Sample Preparation, Multi-Layer Boards CNC Single Spindle Guide Hole Puncher with CCD Image System, Single Spindle CCD Camera Target Hole Drilling Punching Machine for Fr4 Glass Fiber Boards and so on.
Min. Order / Reference FOB Price | |
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1 Piece | US $75000.00/ Piece |
Local Area: | Guangzhou, Guangdong, China |
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R&D Capacity: | OEM, ODM, Other |
Payment Terms: | LC, T/T, PayPal, WesternUnion |
Usage: | Semiconductor |
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Type: | Plate Exposure |
Page: | Single Face |
MD-BG-403D & 403S Mask Aligner is used in exposure process of GPP diode, power device, and other semiconductor device, with convenient operation, steady performance and high productivity.
Main Features:
Mask chuck: two pieces of mask chuck, exposure with exchange, improving work efficiency.
Size of mask: Max5″x5″
Size of wafer: Maxφ4″
Exposure system:Using import mercury lamp,ellipsoidal reflector ,fly's eyes- lens. High light intensity, uniformity and optics resolution can be obtained.
Exposuring Resolution: 5um
Exposure light intensity: ≥10mW/cm2(365nm)
Exposure time:0-999.9s continuous setting
Max exposure area: φ110mm
Non-uniformity: ±3%
Align microscope
Align microscope: two pieces of microscope, operated by two person at the same time, improving productivity.
Total magnification: 20x~40x
Electric control system
Operation is convenient by PLC and LCD display adopted in electric control system, and high reliability and stability could be obtained. Stability and reliability of the equipment are improved by use of key parts from import and professional manufacturer and pneumatic elements from SMC, and personal service is provided for different user.
Main Specifications:
Size of mask: Max5″x5″
Size of wafer: Maxφ4″
Exposuring resolution:5um
Exposure system and wavelength
250W High pressure mercury lamp, UV365
Exposure time:0-999.9s continuous setting
Max Exposure area: φ110mm
Non-uniformity of Exposure: ±3%
Split view field microscope
Total magnification: 20x~40x
Comprason table:
Model:
Mask Size
Wafer Size
Exposure
Type
Manual /Automatic
Application has been in
MD-BG-401A
5inch
4inch
Single side
manual
Small or middle IC,SAW,other
MD-SB-402
5inch
4inch
Dual side
manual
Photoelectric/power device,sensors,hybrid circuits,MEMS etc.
MD-BG-403D
5inch
4inch
Dual side
manual
GPP diode,power device,others.
MD-BG-403S
5inch
4inch
Single side
manual
MD-BG-406
7inch
6inch
Single/double
manual
IC.GPP,LED,MEMS,others
MD-BG-407
5inch
2/3/4
inch
Single side
automatic
LED,Diode,triode,etc.
MD-BG-601A
7inch
6inch
Single/double
manual
Power,sensor,photoelectron devise,etc.
MD-BG-602B/C BX
7inch
6inch
Single/double
manual
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Guangzhou minder-hightech co., ltd www.minder-hightech.com
No.1 Xingya 3 Road, panyu district, guangzhou, China
Shunyu Hu0086-15813334038
Cell phone:0086-15813334038